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Low-Temperature Method for CVD

ID# 2017-4663

Technology Summary

The researchers have developed a method for conformally coating substrates with semiconductors at lower temperatures than is possible with conventional chemical vapor deposition (CVD). The deposited semiconductor can infiltrate very small voids and spaces so that it is possible to deposit onto very large areas within static, rolled-up substrates.

Application & Market Utility

There are many potential applications for low-temperature CVD methods in electronics and optics, medical devices, and multiple manufacturing technologies.

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